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磁控溅射 MoSiCN 硬质薄膜的制备与性能
吕鹏辉; 倪浩明; 崔平; 陈建敏; 方前锋
2010-06-01
Other AbstractMoSiCN films were deposited on the silicon and stainless steel wafers by reactive magnetron sputtering under a bias voltage of −100 V. The structures and mechanical properties of the MoSiCN films were investigated by XRD, XPS, TGA and Nano–indenter, scratch test. It was found that Si contents were closely correlated to the structures of the anocomposite films. We have found that nanocomposite coatings are composed of nanocrystalline MoCNx in a matrix of amorphous SiCN. The hardness of as–deposited films exhibits a maximum hardness at 30 GPa, as evaluated by nanoindentor XP. The oxidation resistance temperature of the film is about 1100 ℃, according to the TGA measurements. Salt spray test of the MoSiCN coatings was also carried out, which exhibited a corrosion time of over 150 h.
Subject Area其他
Keyword纳米复合
Language中文
Document Type其他
Identifierhttp://ir.las.ac.cn/handle/12502/3186
Collection学术报告会_演示报告
Recommended Citation
GB/T 7714
吕鹏辉,倪浩明,崔平,等. 磁控溅射 MoSiCN 硬质薄膜的制备与性能. 2010-06-01.
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